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E-200M
EBP INSTRUMENTS
Shanghai, China
300 Sets Per Month
T/T in advance
1 set
Introduction:
1. Plan achromatic optics and Epi Kohler illumination system and anti-reflective structure in the epi-illumination system, can make the image clarity better contrast of field of view. And effectively prevent interference by stray light.
2. The stable and reliable operating mechanism provide clearer image and easier to operate.
3. Modular microscope body with a new ergonomic design, structural symmetry, can used with many kinds of accessories.
4. Stage, light intensity and low position coarse and fine adjustment, increased comfort of operating.
5. Widely used in various types of semi-conductor silicon wafer inspection, material- s science study, geology mineral analysis and precision engineering and other disciplines.
Technical specifications:
| Model | E-200M |
Optical system | Finity color corrected optical system |
Viewing head | Gemel binocular, 30°inclined, 360°rotating, Interpupillary distance adjustable between 54-75mm, Diopter adjustment ±5 for each side； |
Gemel trinocular, refract rate, binocular: trinocular = 80% : 20% | |
Eyepiece | High eyepoint plan eyepiece PL10X, view of field 18mm |
Objective | LWD plan achromatic metallurgical objective 5X, 10X, 20X, 50X |
Nosepiece | Quadruple nosepiece (4 holes) |
Focusing adjustment | Coaxial coarse and fine adjustment.with coarse adjustment stop and tightness adjustment. Coarse adjustment range:28mm,precision of fine adjustment: 0.002mm |
Stage | Mechanical stage 140x132mm,with 180X145mm deck platform, moving range: 76mmX50mm, accuracy: 0.1mm |
Illumination system | Reflected Kohler illumination, Adaptation wide voltage 90V-240V, 6V/30W halogen bulb, brightness adjustable, with iris diaphragm and field diaphragm, the center of field diaphragm adjustable |
Filter | Blue, green, yellow |
Introduction:
1. Plan achromatic optics and Epi Kohler illumination system and anti-reflective structure in the epi-illumination system, can make the image clarity better contrast of field of view. And effectively prevent interference by stray light.
2. The stable and reliable operating mechanism provide clearer image and easier to operate.
3. Modular microscope body with a new ergonomic design, structural symmetry, can used with many kinds of accessories.
4. Stage, light intensity and low position coarse and fine adjustment, increased comfort of operating.
5. Widely used in various types of semi-conductor silicon wafer inspection, material- s science study, geology mineral analysis and precision engineering and other disciplines.
Technical specifications:
| Model | E-200M |
Optical system | Finity color corrected optical system |
Viewing head | Gemel binocular, 30°inclined, 360°rotating, Interpupillary distance adjustable between 54-75mm, Diopter adjustment ±5 for each side； |
Gemel trinocular, refract rate, binocular: trinocular = 80% : 20% | |
Eyepiece | High eyepoint plan eyepiece PL10X, view of field 18mm |
Objective | LWD plan achromatic metallurgical objective 5X, 10X, 20X, 50X |
Nosepiece | Quadruple nosepiece (4 holes) |
Focusing adjustment | Coaxial coarse and fine adjustment.with coarse adjustment stop and tightness adjustment. Coarse adjustment range:28mm,precision of fine adjustment: 0.002mm |
Stage | Mechanical stage 140x132mm,with 180X145mm deck platform, moving range: 76mmX50mm, accuracy: 0.1mm |
Illumination system | Reflected Kohler illumination, Adaptation wide voltage 90V-240V, 6V/30W halogen bulb, brightness adjustable, with iris diaphragm and field diaphragm, the center of field diaphragm adjustable |
Filter | Blue, green, yellow |
